Sputtered Metal

Chrome(Cr), Tantalum(Ta), Titanium Tungsten(TiW), Tungsten(W)

Our Sputtered Dielectric and Metal deposition is a single sided process that has been designed to deposit ultra-clean films.  An in-situ RF etch is automatically added to the process to insure good film adhesion, and ohmic contact to underlying conductive layers.

Note:

  1. Pricing includes cost of 250Å Ti adhesion layer. Chrome as an adhesion layer is available, must be quoted for each order.

  2. We invoice in batches of 25 wafers .  For example, if 35 wafers are processed the invoice will still equal the amount for 50 wafers.

  3. Typical WTWNU and WIWNU is +/- 10%

  4. Non-Semi Standard Thickness wafers need to be quoted for each order.  

  5. Multi-layer Film Stacks  are available, must be quoted for each order.


    Sputtered Metal and Dielectric Films

    Thickness
    250Å - 3,000Å
    Thickness Tolerance
    Target Thickness +/-10%
    Sides Pressed
    One
    Wafer Thickness
    Semi - Std. Thickness
    Wafer Material
    Silicon
    Gasses
    Argon
    Equipment
    3 Target side sputter system








    Wafer Size
    50.8mm, 76.2mm, 100mm 

    Thickness (Å)

    Price Per Lot

    Price Per Lot

    Price Per Lot

    1 Lot

    2-3 Lots

    4+  Lots

    250 - 3,000
    $412.50
    $393.75
    $375.00

    Wafer Size
    125mm, 150mm

    Thickness (Å)

    Price Per Lot

    Price Per Lot

    Price Per Lot

    1 Lot

    2-3 Lots

    4+  Lots

    250 - 3,000
    $562.50
    $543.75
    $525.00

    Wafer Size
    200mm 

    Thickness (Å)

    Price Per Lot

    Price Per Lot

    Price Per Lot

    1 Lot

    2-3 Lots

    4+  Lots

    250 - 3,000
    $787.50
    $768.75
    $750.00

    Wafer Size
    300mm 

    Thickness (Å)

    Price Per Lot

    Price Per Lot

    Price Per Lot

    1 Lot

    2-3 Lots

    4+  Lots

    250 - 3,000
    $2,100.00
    $2,075.00
    $2,050.00