Dry Thermal Oxide  

Our ultra-pure Dry Oxidation process is available for those applications requiring thinner oxides, and is designed to ensure that you receive the highest quality film.

Note:

  1. All prices include the pre-process clean. 

  2. Please note that we  invoice in Batches of 25 wafers. For example, if 35 wafers are processed the invoice will still equal the amount for 50 wafers.

  3. Float Zone Wafers (FZ)  can be run separate from non-FZ wafers for an additional US$100.00 (up to 25 wafers). For orders greater than 50 wafers this fee is waived.

  4. Typical WTWNU and WIWNU is +/- 5%

  5. Non-Semi Standard Thickness Wafers  must be quoted each order.

  6. Single Sided Processing  is available, must be quoted for each order.


  Dry Thermal Oxidation Parameters

Thickness
100Å – 3000Å
Thickness Tolerance
100Å +/- 30%; 200Å +/-20%; 250Å-300Å +/-15%;         350Å - 500Å +/-10%; > 500Å+/-5%
Sides Pressed
Both
Refractive Index
1.456 +/-0.02 @ 632.8nm
Film Stress
-320MPa +/-50MPa (Compressive)
Wafer Thickness
Std. Thickness
Wafer Material Silicon
Temperature 900C° - 1050C°
Gasses
Oxygen
Equipment Horizontal Furnace









Wafer Size
50.8mm, 76.2mm, 100mm 

Thickness (Å)

Price Per Lot

Price Per Lot

Price Per Lot

1 Lot

2-3 Lots

4+  Lots

1,00 - 1,000
$300.00
$206.25
$187.50
1,001 - 2,000
$337.50 $243.75
$225.00
2,001 - 3,000
$412.50
$281.25
$262.50

Wafer Size
125mm, 150mm

Thickness (Å)

Price Per Lot

Price Per Lot

Price Per Lot

1 Lot

2-3 Lots

4+  Lots

100 - 1,000
$337.50 $243.75
$225.00
1,001 - 2,000
$375.00 $281.25
$262.50
2,001 - 3,000
$450.00
$318.75
$300.00

Wafer Size
200mm

Thickness (Å)

Price Per Lot

Price Per Lot

Price Per Lot

1 Lot

2-3 Lots

4+  Lots

100 - 1,000
$375.00 $281.25
$262.50
1,001 - 2,000
$412.50 $318.75
$300.00
2,001 - 3,000
$487.50
$356.25
$337.50