2022 Pricing effective 10/1/21
PECVD Oxide
Our PECVD Oxide is a single sided film that has been optimized for wafers requiring minimal thermal processing. Because PECVD is a deposited oxide, it offers greater flexibility than thermal oxide and can be deposited over any of our other thin films.
E-mail for lead time.
Note:
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Non-Silicon Substrates please e-mail for a quote .
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We invoice in batches of 25 wafers . For example, if 35 wafers are processed the invoice will still equal the amount for 50 wafers.
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Typical WTWNU and WIWNU is +/- 7%
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Non - Semi Standard Thickness wafers need to be quoted for each order.
PECVD Oxide Parameters |
|
Thickness |
300Å – 50,00Å |
Thickness Tolerance |
300Å - 999Å +/-15%; ≥1,000Å+/-7% |
Sides Pressed |
One |
Refractive Index |
1.46 +/-0.02 @ 632.8nm |
Film Stress |
-400MPa +/-50MPa (Compressive) |
Wafer Material |
Silicon, Silicon on Insulator, Quartz, Glass, Sapphire |
Wafer Thickness |
Std. Thickness |
Temperature | 300C°- 400C° |
Gases | Silane, Nitrous oxide |
Equipment | PlasmaTherm and Novelles Deposition tools |
Wafer Size
50.8mm, 76.2mm, 100mm
Thickness ( Å ) |
Price per
Lot
|
Price per
Lot
|
300 - 5,000 |
$552.50 |
$510.00 |
5,001 - 10,000 |
$637.50 | $595.00 |
10,001 - 20,000 |
$807.50 |
$765.00 |
20,001 - 30,000 |
$977.50 | $935.00 |
30,001 - 40,000 |
$1,147.50 |
$1,105.00 |
40,001 - 50,000 |
$1,317.50 | $1,275.00 |
Wafer Size
125mm,150mm
Thickness ( Å ) |
Price per
Lot
|
Price per
Lot
|
300 - 5,000 |
$680.00 | $637.50 |
5,001 - 10,000 |
$765.00 |
$722.50 |
10,001 - 20,000 |
$892.50 | $850.00 |
20,001 - 30,000 |
$1,062.50 |
$1,020.00 |
30,001 - 40,000 |
$1,232.50 | $1,190.00 |
40,001 - 50,000 |
$1,402.50 |
$1,360.00 |
Wafer Size
200mm
Thickness ( Å ) |
Price per
Lot
|
Price per
Lot
|
300 - 5,000 |
$977.50 |
$935.00 |
5,001 - 10,000 |
$1,062.50 | $1,020.00 |
10,001 - 20,000 |
$1,232.50 |
$1,190.00 |
20,001 - 30,000 |
$1,402.50 | $1,360.00 |
30,001 - 40,000 |
$1,572.50 |
$1,530.00 |
40,001 - 50,000 |
$1,742.50 | $1,700.00 |