PECVD Low Stress Nitride

Our PECVD Low Stress Nitride is a single sided film that has been optimized for wafers requiring minimal thermal processing.  Because PECVD Nitride is deposited at low temperatures, it offers greater flexibility and can be deposited over any of our other thin films.  E-mail for lead time.

Note:

  1. Non-Silicon Substrates  please e-mail for a quote

  2. We invoice in batches of 25 wafers .  For example, if 35 wafers are processed the invoice will still equal the amount for 50 wafers.

  3. Typical WTWNU and WIWNU is +/- 7%

  4. Non - Semi Standard Thickness wafers need to be quoted for each order.


PECVD Low Nitride Parameters

Thickness
300Å – 20,00Å
Thickness Tolerance
300Å - 999 Å +/-10%; => 1,000 Å+/-7%
Sides Pressed
One
Refractive Index
1.98 +/-0.05 @ 632.8nm
Film Stress
+400MPa +/-50MPa (Tensile Stress)
Wafer Material
Silicon, Silicon on Insulator
Wafer Thickness
Std. Thickness
Temperature 300C°- 400C°
Gases Silane, Ammonia, Nitrous Oxide
Equipment PlasmaTherm and Novelles Deposition tools

Wafer Size
50.8mm, 76.2mm, 100mm

Thickness ( Å )
Price per Lot
1 Lot
Price per Lot
4 + lots
300 - 5,000
$637.50
$600.00
5,001 - 10,000
$750.00
$712.50
10,001 - 20,000
$975.00
$937.50

Wafer Size
125mm, 150mm

Thickness ( Å )
Price per Lot
1 Lot
Price per Lot
4 + lots
300 - 5,000
$750.00
$712.50
5,001 - 10,000
$862.50
$825.00
10,001 - 20,000
$1,087.50
$1,050.00

Wafer Size
200mm

Thickness ( Å )
Price per Lot
1 Lot
Price per Lot
4 + lots
300 - 5,000
$1,012.50
$975.00
5,001 - 10,000
$1,125.00
$1,087.50
10,001 - 20,000
$1,350.00
$1,312.50

Wafer Size
300mm

Thickness ( Å )
Price per Lot
1 Lot
Price per Lot
4 + lots
300 - 5,000
$3,000.00
$3,000.00