2022 Pricing effective 10/1/21

Stoichiometric LPCVD Nitride

Our Stoichiometric LPCVD Nitride film has many uses and is often used as a tool for defining active regions during field oxidation. If planning to use nitride as a KOH mask for through wafer etching, our Low Stress Nitride or Oxide/Nitride Film may yield the best results. Prior to LPCVD Nitride deposition all wafers will be inspected and receive a pre-process clean if necessary. 

Note:

  1. No Glass wafers because they will melt during processing.  

  2. Sapphire substrates  please e-mail for a quote. Quartz wafers can only be processed with Super Low Stress LPCVD Nitride .

  3. We invoice in batches of 25 wafers.  For example, if 35 wafers are processed the invoice will still equal the amount for 50 wafers.

  4. Typical WTWNU and WIWNU is +/- 5%

  5. Non-Semi Standard Thickness wafers  need to be quoted for each order.




Stoichiometric Nitride Parameters


Thickness
 100Å – 4,500Å

Thickness Tolerance
 100Å - 499Å +/-30%; 500Å + 999Å +/-10%; ≥1,000Å +/-5%

Sides Pressed
 Both

Refractive Index
 2.00 +/-0.05 @ 632.8nm

Film Stress
 =>800MPa +/-50MPa Tensile Stress

Wafer Material
 Silicon, Silicon on Insulator

Wafer Thickness
 Std. Thickness

Temperature ~800C°

Gases Dichlorosilane, Ammonia

Equipment Horizontal Furnace

Wafer Size
50.8mm, 76.2mm, 100mm

Thickness ( Å )
Price per Lot
1 Lot
Price per Lot
4 + lots
100 - 1,000
 $467.50
 $425.00
1,001 - 2,000
 $488.75
 $446.25
2,001 - 3,000
 $510.00
 $467.50
3,001 - 4,000
 $531.25
 $488.75
4,000 - 4,500
 $552.50
 $510.00

Wafer Size
125mm, 150mm

Thickness ( Å )
Price per Lot
1 Lot
Price per Lot
4 + lots
100 - 1,000
 $510.00
 $467.50
1,001 - 2,000
 $531.25 $488.75
2,001 - 3,000
 $552.50
 $510.00
3,001 - 4,000
 $573.75 $531.25
4,000 - 4,500
 $595.00
 $552.50

Wafer Size
200mm

Thickness ( Å )
Price per Lot
1 Lot
Price per Lot
4 + lots
100 - 1,000
 $722.50
 $680.00
1,001 - 2,000
 $743.75 $701.25
2,001 - 3,000
 $765.00
 $722.50
3,001 - 4,000
 $786.25 $743.75
4,000 - 4,500
 $807.50
 $765.00