Stoichiometric LPCVD Nitride
Our Stoichiometric LPCVD Nitride film has many uses and is often used as a tool for defining active regions during field oxidation. If planning to use nitride as a KOH mask for through wafer etching, our Low Stress Nitride or Oxide/Nitride Film may yield the best results. Prior to LPCVD Nitride deposition all wafers will be inspected and receive a pre-process clean if necessary.
Note:
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No Glass wafers because they will melt during processing.
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Sapphire substrates please e-mail for a quote. Quartz wafers can only be processed with Super Low Stress LPCVD Nitride .
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We invoice in batches of 25 wafers. For example, if 35 wafers are processed the invoice will still equal the amount for 50 wafers.
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Typical WTWNU and WIWNU is +/- 5%
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Non-Semi Standard Thickness wafers need to be quoted for each order.
Stoichiometrice Nitride Parameters |
|
Thickness |
100Å – 4,500Å |
Thickness Tolerance |
100Å +/- 30%; 200Å +/-20%; 250Å-300Å +/-15%; 350Å - 500Å +/-10%; > 500Å+/-5% |
Sides Pressed |
Both |
Refractive Index |
2.00 +/-0.05 @ 632.8nm |
Film Stress |
=>800MPa +/-50MPa Tensile Stress |
Wafer Material |
Silicon, Silicon on Insulator |
Wafer Thickness |
Std. Thickness |
Temperature | ~800C° |
Gases | Dichlorosilane, Ammonia |
Equipment | Horizontal Furnace |
Wafer Size
50.8mm, 76.2mm, 100mm
Thickness ( Å ) |
Price per
Lot
|
Price per
Lot
|
100 - 1,000 |
$400.00 |
$360.00 |
1,001 - 2,000 |
$420.00 |
$380.00 |
2,001 - 3,000 |
$440.00 |
$400.00 |
3,001 - 4,000 |
$460.00 |
$420.00 |
4,000 - 4,500 |
$480.00 |
$440.00 |
Wafer Size
125mm, 150mm
Thickness ( Å ) |
Price per
Lot
|
Price per
Lot
|
100 - 1,000 |
$440.00 |
$400.00 |
1,001 - 2,000 |
$460.00 |
$420.00 |
2,001 - 3,000 |
$480.00 |
$440.00 |
3,001 - 4,000 |
$500.00 |
$460.00 |
4,000 - 4,500 |
$520.00 |
$480.00 |
Wafer Size
200mm
Thickness ( Å ) |
Price per
Lot
|
Price per
Lot
|
100 - 1,000 |
$640.00 |
$600.00 |
1,001 - 2,000 |
$660.00 |
$620.00 |
2,001 - 3,000 |
$680.00 |
$640.00 |
3,001 - 4,000 |
$700.00 |
$660.00 |
4,000 - 4,500 |
$720.00 |
$680.00 |