2022 Pricing effective 10/1/21

Stoichiometric LPCVD Nitride

Our Stoichiometric LPCVD Nitride film has many uses and is often used as a tool for defining active regions during field oxidation. If planning to use nitride as a KOH mask for through wafer etching, our Low Stress Nitride or Oxide/Nitride Film may yield the best results. Prior to LPCVD Nitride deposition all wafers will be inspected and receive a pre-process clean if necessary. 

Note:

  1. No Glass wafers because they will melt during processing.  

  2. Sapphire substrates  please e-mail for a quote. Quartz wafers can only be processed with Super Low Stress LPCVD Nitride .

  3. We invoice in batches of 25 wafers.  For example, if 35 wafers are processed the invoice will still equal the amount for 50 wafers.

  4. Typical WTWNU and WIWNU is +/- 5%

  5. Non-Semi Standard Thickness wafers  need to be quoted for each order.




Stoichiometrice Nitride Parameters


Thickness
100Å – 4,500Å

Thickness Tolerance
100Å - 149Å +/- 30%; 150Å - 299Å +/-20%;
300Å - 499Å +/-10%; > 500Å+/-5%

Sides Pressed
Both

Refractive Index
2.00 +/-0.05 @ 632.8nm

Film Stress
=>800MPa +/-50MPa Tensile Stress

Wafer Material
Silicon, Silicon on Insulator

Wafer Thickness
Std. Thickness

Temperature ~800C°

Gases Dichlorosilane, Ammonia

Equipment Horizontal Furnace

Wafer Size
50.8mm, 76.2mm, 100mm

Thickness ( Å )
Price per Lot
1 Lot
Price per Lot
4 + lots
100 - 1,000
$467.50
$425.00
1,001 - 2,000
$488.75
$446.25
2,001 - 3,000
$510.00
$467.50
3,001 - 4,000
$531.25
$488.75
4,000 - 4,500
$552.50
$510.00

Wafer Size
125mm, 150mm

Thickness ( Å )
Price per Lot
1 Lot
Price per Lot
4 + lots
100 - 1,000
$510.00
$467.50
1,001 - 2,000
$531.25 $488.75
2,001 - 3,000
$552.50
$510.00
3,001 - 4,000
$573.75 $531.25
4,000 - 4,500
$595.00
$552.50

Wafer Size
200mm

Thickness ( Å )
Price per Lot
1 Lot
Price per Lot
4 + lots
100 - 1,000
$722.50
$680.00
1,001 - 2,000
$743.75 $701.25
2,001 - 3,000
$765.00
$722.50
3,001 - 4,000
$786.25 $743.75
4,000 - 4,500
$807.50
$765.00