Stoichiometric LPCVD Nitride

Our Stoichiometric LPCVD Nitride film has many uses and is often used as a tool for defining active regions during field oxidation. If planning to use nitride as a KOH mask for through wafer etching, our Low Stress Nitride or Oxide/Nitride Film may yield the best results. Prior to LPCVD Nitride deposition all wafers will be inspected and receive a pre-process clean if necessary. 

Note:

  1. No Glass wafers because they will melt during processing.  

  2. Sapphire substrates  please e-mail for a quote. Quartz wafers can only be processed with Super Low Stress LPCVD Nitride .

  3. We invoice in batches of 25 wafers.  For example, if 35 wafers are processed the invoice will still equal the amount for 50 wafers.

  4. Typical WTWNU and WIWNU is +/- 5%

  5. Non-Semi Standard Thickness wafers  need to be quoted for each order.



Stoichiometrice Nitride Parameters

Thickness
 100Å – 4,500Å
Thickness Tolerance
 100Å +/- 30%; 200Å +/-20%; 250Å-300Å +/-15%;         350Å - 500Å +/-10%; > 500Å+/-5%
Sides Pressed
 Both
Refractive Index
 2.00 +/-0.05 @ 632.8nm
Film Stress
 =>800MPa +/-50MPa Tensile Stress
Wafer Material
 Silicon, Silicon on Insulator
Wafer Thickness
 Std. Thickness
Temperature ~800C°
Gases Dichlorosilane, Ammonia
Equipment Horizontal Furnace

Wafer Size
50.8mm, 76.2mm, 100mm

Thickness ( Å )
Price per Lot
1 Lot
Price per Lot
4 + lots
100 - 1,000
 $400.00
 $360.00
1,001 - 2,000
 $420.00
 $380.00
2,001 - 3,000
 $440.00
 $400.00
3,001 - 4,000
 $460.00
 $420.00
4,000 - 4,500
 $480.00
 $440.00

Wafer Size
125mm, 150mm

Thickness ( Å )
Price per Lot
1 Lot
Price per Lot
4 + lots
100 - 1,000
 $440.00
 $400.00
1,001 - 2,000
 $460.00
 $420.00
2,001 - 3,000
 $480.00
 $440.00
3,001 - 4,000
 $500.00
 $460.00
4,000 - 4,500
 $520.00
 $480.00

Wafer Size
200mm

Thickness ( Å )
Price per Lot
1 Lot
Price per Lot
4 + lots
100 - 1,000
 $640.00
 $600.00
1,001 - 2,000
 $660.00
 $620.00
2,001 - 3,000
 $680.00
 $640.00
3,001 - 4,000
 $700.00
 $660.00
4,000 - 4,500
 $720.00
 $680.00